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Handbook of Thin Film Deposition by Krishna Seshan (2012, Hardcover)
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Ubicado en: Coolidge, Arizona, Estados Unidos
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Entrega prevista entre el lun. 3 nov. y el sáb. 8 nov. a 94104
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N.º de artículo de eBay:404182224672
Última actualización el 17 jul 2025 18:50:34 H.EspVer todas las actualizacionesVer todas las actualizaciones
Características del artículo
- Estado
- ISBN
- 9781437778731
Acerca de este producto
Product Identifiers
Publisher
Elsevier Science & Technology Books
ISBN-10
1437778739
ISBN-13
9781437778731
eBay Product ID (ePID)
112880301
Product Key Features
Number of Pages
408 Pages
Publication Name
Handbook of Thin Film Deposition
Language
English
Publication Year
2012
Subject
Materials Science / General, Materials Science / Thin Films, Surfaces & Interfaces, Electronics / General, Physics / General
Type
Textbook
Subject Area
Technology & Engineering, Science
Format
Hardcover
Dimensions
Item Length
9 in
Item Width
6 in
Additional Product Features
Edition Number
3
Intended Audience
Scholarly & Professional
LCCN
2012-472459
Dewey Edition
23
Illustrated
Yes
Dewey Decimal
621.38152
Table Of Content
Foreword to the Third Edition Scaling of Devices and Thermal Scaling PVD - Special Topics CVD New Developments CVD Equipment CMP Method and Practice Process Technology for Copper Interconnects Optical Thin Films Thin Films in Photovoltaics Thin Films in Memory Applications Index
Synopsis
The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films., The Handbook of Thin Film Deposition is a comprehensive reference focusing on thin film technologies and applications used in the semiconductor industry and the closely related areas of thin film deposition, thin film micro properties, photovoltaic solar energy applications, new materials for memory applications and methods for thin film optical processes. In a major restructuring, this edition of the handbook lays the foundations with an up-to-date treatment of lithography, contamination and yield management, and reliability of thin films. The established physical and chemical deposition processes and technologies are then covered, the last section of the book being devoted to more recent technological developments such as microelectromechanical systems, photovoltaic applications, digital cameras, CCD arrays, and optical thin films. A practical survey of thin film technologies aimed at engineers and managers involved in all stages of the process: design, fabrication, quality assurance and applications Covers core processes and applications in the semiconductor industry and new developments in the photovoltaic and optical thin film industries The new edition takes covers the transition taking place in the semiconductor world from Al/SiO2 to copper interconnects with low-k dielectrics Written by acknowledged industry experts from key companies in the semiconductor industry including Intel and IBM Foreword by Gordon E. Moore, co-founder of Intel and formulator of the renowned 'Moore's Law' relating to the technology development cycle in the semiconductor industry
LC Classification Number
TA418.9.T45
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